High rate deposition of thin film cadmium sulphide by pulsed direct current magnetron sputtering
نویسندگان
چکیده
منابع مشابه
Development of Zirconium Thin Films by Pulsed Direct Current Magnetron Sputtering: Effect of Pulsed Parameters
This paper characterizes phases present in thin Zr films at 773 K of substrate temperature. The effect of pulsed parameters such as pulse frequency, duty cycle and pulse power during the deposition of Zr film on Si(100) at the substrate temperature of 773 K has been studied. Formation of α-phase of zirconium was noticed with (001) preferred orientation at 773 K. Preferred orientation was found ...
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Sputter deposition process is another old technique being used in modern semiconductor industries. Sputtering is a process that can deposit TiO2 material on wafer/glass substrates. In this process target is connected to negative high voltage. Further argon gas is introduced into the chamber and is ionized to a positive charge. The positively charged argon atoms are attracted and strike the nega...
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ژورنال
عنوان ژورنال: Thin Solid Films
سال: 2015
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2014.11.065